Praxair Electronics, the subsidiary company of Praxair group has yesterday announced the support for the Industry’s Leading Ion Implant Platform with Advanced Gas Delivery System.
Praxair adopted UpTime(R) sub-atmospheric dopant gas delivery system that has been selected to be the factory default standard for Applied Materials’ flagship Varian VIISta(R) ion implant platform.
Ion implantation is a modernized process used in the fabrication of microchips in which ions created from highly specialized gases, are accelerated and implanted into silicon wafers to modify the properties of a film. Company has selected the most preferred sub-atmospheric dopant supplier for the Solion(TM) implant tool developed by Varian Semiconductor Equipment for the solar photovoltaic market.
VIISta system is the industry’s leading ion implant platform with over 1,500 tools installed worldwide. According to Praxair’ officials, this platform are a validation of its advanced and cost-effective capabilities. Semi-conductor industry is being emerged as the major key front for the industrial gases segment in last two years. Companies like Air Liquide & Air Products have too taken initiatives to get into the depth of this innovative technology.
“We are pleased to offer customers Praxair’s UpTime system on our VIISta platform,” said Matt Gaucher, general manager of high current implantation at Varian Semiconductor Equipment, a division of Applied Materials, Inc. “Compared to other available options, the UpTime system has demonstrated significantly improved operational productivity on our platform.”
Praxair Press Release
“We look forward to continuing our work with Applied in identifying and jointly bringing to market additional productivity enhancements to customers in the implant space,” added Lisa Fanti, director of product commercialization at Praxair. “Applied’s adoption of UpTime for their market-leading implant platform is a validation of its advanced and cost-effective capabilities.”